Gordon Research Conferences
Meeting Details

Plasma Processing Science (GRS)
Gordon Research Seminar

New Challenges of Plasma Science and Cutting Edge Plasma Applications


July 23-24, 2016


Proctor Academy
Andover, NH


Natalie Chernets & Matteo Gherardi

Meeting Description

The Gordon Research Seminar on Plasma Processing Science is an international forum primarily intended for advanced graduate students, post-doctoral fellows, and junior scientists currently pursuing cutting-edge research within the field of Plasma Processing Science. This Seminar precedes the larger Gordon Research Conference on Plasma Processing Science (July 24-29, 2016).

The program of the 2016 Gordon Research Seminar on Plasma Processing Science will highlight recent progress concerning breakthrough innovations in the fields of plasma medicine, plasma interaction with liquids and plasma assisted nanofabrication. Participants are encouraged to showcase and present their pioneering and unpublished research, discuss recent advancements and future directions with established leaders in the field, and build networks with their peers that will lead to a lifetime of scientific collaboration and achievement. Furthermore, in order to promote the discussion of cutting-edge research, Gordon Research Seminars are officially "off-the-record", with no abstracts or proceedings published before, during or after the conference, and ample time is provided between sessions for socializing and informal discussions with fellow attendees. In addition, the 2016 Gordon Research Seminar on Plasma Processing Science will feature a mentoring panel assembled from leading scientists representing industrial word, academia and administration.

Related Meeting

This GRS was held in conjunction with the "Plasma Processing Science" Gordon Research Conference (GRC). Refer to the associated GRC program page for more information.


Final Meeting Program

2:00 pm - 5:00 pmArrival and Check-in
3:30 pm - 3:45 pmIntroductory Comments by GRC Site Staff / Welcome by the GRS Conference Chair
3:45 pm - 4:30 pmComputational and Experimental Plasma Physics and Chemistry
Discussion Leader: Adam Obrusnik (Masaryk University, Czech Republic)
3:45 pm - 4:05 pmDmitry Levko (The University of Texas at Austin, USA)
"Non-Equilibrium Plasma Reforming of Hydrocarbon Fuels"
4:05 pm - 4:15 pmDiscussion
4:15 pm - 4:25 pmYanjun Du (University of Minnesota, USA / Tsinghua University, China)
"Absolute OH Density Measurement by the Relative Optical Emission Spectroscopy"
4:25 pm - 4:30 pmDiscussion
4:30 pm - 6:00 pmPoster Session
6:00 pmDinner
7:30 pm - 9:30 pmRecent Advancements in Plasma Medicine: Fundamental Aspects and Applications in Oncology, Dermatology and Dentistry; Plasma Interaction with Liquids: Elementary Processes and Future Applications
Discussion Leader: Dayun Yan (The George Washington University, USA)
7:30 pm - 7:50 pmShota Sasaki (Tohoku University, Japan)
"Activation of Sensory Channels in Cell Membrane Using Plasma-Generated Reactive Species"
7:50 pm - 8:00 pmDiscussion
8:00 pm - 8:10 pmEk Adhikari (University of Notre Dame, USA)
"The Role of Helium Atmospheric Pressure Plasma Jet (APPJ) Parameters on Plasma Induced DNA Damage"
8:10 pm - 8:15 pmDiscussion
8:15 pm - 8:25 pmXu Han (University of Notre Dame, USA)
"DNA Damage in Oral Cancer Cells Induced by Nitrogen Atmospheric Pressure Plasma Jets"
8:25 pm - 8:30 pmDiscussion
8:30 pm - 8:50 pmEva Dolezalova (Institute of Plasma Physics, Czech Academy of Sciences, Czech Republic)
"Mechanism of Plasma Induced Bacterial Inactivation in Liquid Medium"
8:50 pm - 9:00 pmDiscussion
9:00 pm - 9:10 pmYury Gorbanev (University of York, United Kingdom)
"Non-Thermal Plasma in Contact with Water: The Origin of Species"
9:10 pm - 9:15 pmDiscussion
9:15 pm - 9:25 pmCarly Anderson (University of California, Berkeley, USA)
"Oxidative and Reductive Chemistries Produced by Cold-Atmospheric Plasma in Liquids"
9:25 pm - 9:30 pmDiscussion
7:30 am - 8:30 amBreakfast
9:00 am - 11:00 amPlasma Modification of Materials and Nanofabrication; Environmental, Agricultural and Industrial Plasma Applications
Discussion Leaders: Souvik Ghosh (Case Western Reserve University, USA) and Jin Hoon Cho (University of Illinois at Urbana-Champaign, USA)
9:00 am - 9:20 amDirk van den Bekerom (FOM Institute DIFFER, The Netherlands)
"Via Vibrational Excitation in a Microwave CO2 Plasma to Efficient Synthetic Fuel Production"
9:20 am - 9:35 amDiscussion
9:35 am - 9:55 amKatharine Hunter (University of Minnesota, USA)
"Nonthermal Plasma Synthesis of Quantum Dot Core/Shell Heterostructures for Optoelectronic Applications"
9:55 am - 10:10 amDiscussion
10:10 am - 10:25 amFiona Elam (Fujifilm, The Netherlands)
"Atmospheric Pressure Plasma Enhanced CVD of High Quality Silica-Like Bilayer Encapsulation Films"
10:25 am - 10:30 amDiscussion
10:30 am - 10:45 amPingshan Luan (University of Maryland, College Park, USA)
"Effect of Water Vapor on Polymer Etching by a Time Modulated RF Plasma Jet"
10:45 am - 10:50 amDiscussion
10:50 am - 11:00 amGeneral Discussion
11:00 am - 12:30 pmPoster Session

Coffee will be served in the poster area from 11:00 am - 11:30 am
12:30 pmLunch
1:30 pm - 2:30 pmMentorship Component: Careers in Plasma Science - Industry vs Academia
Discussion Leader: Matteo Gherardi (Alma Mater Studiorum - Università di Bologna, Italy)
1:30 pm - 2:20 pmDiego Mantovani (Laval University, Canada)
"What Do You Need to Do TODAY to Succeed in Your Plasma Science Career"
2:20 pm - 2:30 pmDiscussion
2:30 pm - 3:00 pmEvaluation Period
Fill in GRS Evaluation Forms
3:00 pmSeminar Concludes

This material is based upon work supported by the U.S. Department of Energy, Office of Science, Office of Acquisition and Assistance, under Award Number DC-SC0015654. This report was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government nor any agency thereof, nor any of their employees, makes any warranty, express or implied, or assumes any legal liability or responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government or any agency thereof. The views and opinions of authors expressed herein do not necessarily state or reflect those of the United States Government or any agency thereof.
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